Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch

Published 2020 View Full Article

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Title
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
Authors
Keywords
-
Journal
Journal of Micro-Nanolithography MEMS and MOEMS
Volume 19, Issue 03, Pages 1
Publisher
SPIE-Intl Soc Optical Eng
Online
2020-07-01
DOI
10.1117/1.jmm.19.3.034001

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