4.6 Article

InP HEMTs for Sub-mW Cryogenic Low-Noise Amplifiers

Journal

IEEE ELECTRON DEVICE LETTERS
Volume 41, Issue 7, Pages 1005-1008

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2020.3000071

Keywords

Cryogenic; C-band; InP high-electron-mobility transistor (InP HEMT); low-noise amplifier (LNA); noise; power dissipation

Funding

  1. GigaHertz Centre by Swedish Governmental Agency of Innovation System (Vinnova)
  2. RISE Research Institutes of Sweden
  3. Chalmers University of Technology
  4. Low Noise Factory AB
  5. Omnisys Instruments
  6. Wasa Millimeter Wave

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This paper reports on a 100-nm gate length InP high-electron-mobility transistor (HEMT) technology for cryogenic low-noise amplifiers (LNAs) with ultra-low power dissipation of 112 mu W. This result was obtained by using 100-nm gate length InP HEMTs with improved transconductance at low drain current through a scaled-down gate-channel distance while maintaining a low gate leakage current with the use of an InP etch stop layer and Pt gate metal. The noise performance of InP HEMTs was demonstrated in a 4-8 GHz (C-band) three-stage hybrid LNA at the ambient temperature of 5 K. At a dc power dissipation of 300 mu W, the average noise temperature was 2.8 K with 27 dB gain. At a dc power dissipation of 112 mu W, the LNA exhibited an average noise temperature of 4.1 K with a gain of 20 dB. The presented results demonstrate the large potential of InP HEMT technology for sub-mW cryogenic LNA design.

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