Power matching to pulsed inductively coupled plasmas

Time-Resolved Electron Density Measurement Characterization of E–H-Modes for Inductively Coupled Plasma Instabilities

(2019) David J. Coumou et al.   IEEE TRANSACTIONS ON PLASMA SCIENCE

Multi frequency matching for voltage waveform tailoring

(2018) Frederik Schmidt et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Atomic layer etching of GaN and AlGaN using directional plasma-enhanced approach

(2017) Tomihito Ohba et al.   JAPANESE JOURNAL OF APPLIED PHYSICS

Experimental and numerical investigations on time-resolved characteristics of pulsed inductively coupled O2/Ar plasmas

(2017) Chan Xue et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma

(2016) Dominik Metzler et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Ignition delay of a pulsed inductively coupled plasma (ICP) in tandem with an auxiliary ICP

(2015) Lei Liu et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Electron heating during E-H transition in inductively coupled RF plasmas

(2015) Th Wegner et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Power supply and impedance matching to drive technological radio-frequency plasmas with customized voltage waveforms

(2015) James Franek et al.   REVIEW OF SCIENTIFIC INSTRUMENTS

E→H mode transition density and power in two types of inductively coupled plasma configuration

(2014) Jian Wang et al.   PHYSICS OF PLASMAS

Two-dimensional simulation of inductive–capacitive transition instability in an electronegative plasma

(2012) E Kawamura et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design

(2009) Mark J Kushner   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Observation of inverse hysteresis in the E to H mode transitions in inductively coupled plasmas

(2009) Min-Hyong Lee et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Global model of instabilities in low-pressure inductive chlorine discharges

(2009) E Despiau-Pujo et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Plasma power measurement and hysteresis in the E–H transition of a rf inductively coupled plasma system

(2008) A. M. Daltrini et al.   APPLIED PHYSICS LETTERS

Electrical characterization of an inductively coupled gaseous electronics conference reference cell

(2008) S. V. Singh et al.   JOURNAL OF APPLIED PHYSICS

Stochastic heating in asymmetric capacitively coupled RF discharges

(2008) J Schulze et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Enhancement of Ohmic and Stochastic Heating by Resonance Effects in Capacitive Radio Frequency Discharges: A Theoretical Approach

(2008) T. Mussenbrock et al.   PHYSICAL REVIEW LETTERS