4.7 Article

Interface stabilization via lithium bis(fluorosulfonyl)imide additive as a key for promoted performance of graphite∥LiCoO2 pouch cell under-20 °C

Journal

JOURNAL OF CHEMICAL PHYSICS
Volume 152, Issue 9, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.5144280

Keywords

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Funding

  1. Korean Ministry of Trade, Industry and Energy [A0022-00725, R0004645]
  2. National Research Foundation - Korean Ministry of Science and ICT [2019R1A2C1084024]
  3. National Research Foundation of Korea [21A20151513147, 2019R1A2C1084024] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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The effects of lithium bis(fluorosulfonyl)imide, Li[N(SO2F)(2)] (LiFSI), as an additive on the low-temperature performance of graphite||LiCoO2 pouch cells are investigated. The cell, which includes 0.2M LiFSI salt additive in the 1M lithium hexafluorophosphate (LiPF6)-based conventional electrolyte, outperforms the one without additive under -20 degrees C and high charge cutoff voltage of 4.3 V, delivering higher discharge capacity and promoted rate performance and cycling stability with the reduced change in interfacial resistance. Surface analysis results on the cycled LiCoO2 cathodes and cycled graphite anodes extracted from the cells provide evidence that a LiFSI-induced improvement of high-voltage cycling stability at low temperature originates from the formation of a less resistive solid electrolyte interphase layer, which contains plenty of LiFSI-derived organic compounds mixed with inorganics that passivate and protect the surface of the cathode and anode from further electrolyte decomposition and promotes Li+ ion-transport kinetics despite the low temperature, inhibiting Li metal-plating at the anode. The results demonstrate the beneficial effects of the LiFSI additive on the performance of a lithium-ion battery for use in battery-powered electric vehicles and energy storage systems in cold climates and regions. Published under license by AIP Publishing.

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