Excellent Ferroelectric Properties of Hf0.5Zr0.5O2 Thin Films Induced by Al2O3 Dielectric Layer

Published 2019 View Full Article

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Title
Excellent Ferroelectric Properties of Hf0.5Zr0.5O2 Thin Films Induced by Al2O3 Dielectric Layer
Authors
Keywords
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Journal
IEEE ELECTRON DEVICE LETTERS
Volume 40, Issue 12, Pages 1937-1940
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Online
2019-11-05
DOI
10.1109/led.2019.2950916

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