Fabrication of sharp silicon hollow microneedles by deep-reactive ion etching towards minimally invasive diagnostics

Title
Fabrication of sharp silicon hollow microneedles by deep-reactive ion etching towards minimally invasive diagnostics
Authors
Keywords
-
Journal
Microsystems & Nanoengineering
Volume 5, Issue 1, Pages -
Publisher
Springer Science and Business Media LLC
Online
2019-08-26
DOI
10.1038/s41378-019-0077-y

Ask authors/readers for more resources

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started