4.6 Article

Study of plasma characteristic and properties of flexible ultra-thin ITO films prepared by large area 3-D confined and planar magnetron sputtering

Journal

VACUUM
Volume 165, Issue -, Pages 246-253

Publisher

PERGAMON-ELSEVIER SCIENCE LTD
DOI: 10.1016/j.vacuum.2019.04.029

Keywords

Transparent conducting oxide (TCO); Planar magnetron sputtering; 3-D confined magnetron sputtering; Ultra thin ITO film; High density plasma

Funding

  1. National Research Foundation of Korea - Ministry of Science and ICT (MSIT) [NRF-2017R1A2B4006071]
  2. ICT (MSIT) [NRF-2016K1A4A3914113]

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This work presents the plasma characteristics in a conventional planar magnetron source (PMS) and a large 3-D confined magnetron source (3DMS). We utilize different plasma diagnostic methods to study the plasma characteristics and the favorable plasma condition for the deposition of ultra-thin indium tin oxide (ITO) film near room temperature. Measurements of plasma parameters by Langmuir probe (LP) and energy flux by Calorimetric probe (CP) respectively showed a very high-density plasma and deposited energy flux (EF) on the substrate when operated by the 3DMS. Plasma diagnostic reveals that the plasma density measured in the 3DMS process is nearly one order higher compared to that of the PMS process. We consider the experimental condition of high-density plasma and deposition EF as the favorable process condition for the deposition. In this condition, flexible ultra-thin ITO (UT-ITO) films were deposited by changing the O-2 flow rate. The role of negative oxygen ions (NOIs) on the film properties is studied at different O-2 flow rates. The condition with the lowest NOI flux produced a UT-ITO film with the lowest resistivity similar to 5.0 x 10(-4) Omega cm and visible transmittance similar to 82% with crystalline microstructure and smooth morphology using 3DMS at low-temperature.

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