Parametric study and residual gas analysis of large-area silicon-nitride thin-film deposition by plasma-enhanced chemical vapor deposition

Published 2019 View Full Article

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Title
Parametric study and residual gas analysis of large-area silicon-nitride thin-film deposition by plasma-enhanced chemical vapor deposition
Authors
Keywords
PECVD, Silicon-nitride, Thin film, Process parameter, Residual gas
Journal
VACUUM
Volume 165, Issue -, Pages 172-178
Publisher
Elsevier BV
Online
2019-04-17
DOI
10.1016/j.vacuum.2019.04.017

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