Memcapacitive characteristics in reactive-metal (Mo, Al)/HfOX/n-Si structures through migration of oxygen by applied voltage

Title
Memcapacitive characteristics in reactive-metal (Mo, Al)/HfOX/n-Si structures through migration of oxygen by applied voltage
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 108, Issue 5, Pages 052108
Publisher
AIP Publishing
Online
2016-02-06
DOI
10.1063/1.4941548

Ask authors/readers for more resources

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation