Journal
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 122, Issue 5, Pages -Publisher
SPRINGER HEIDELBERG
DOI: 10.1007/s00339-016-9990-1
Keywords
-
Funding
- National Key Technology RD Program [2011BAK15B07]
Ask authors/readers for more resources
Nb thin films were deposited onto Si wafers by direct current (DC) magnetron sputtering at different deposition pressures. The microstructure and nanomechanical properties of Nb films were investigated by scanning electron microscope, X-ray diffractometer, transmission electron microscope, atomic force microscope and nanoindenter. The results revealed that the grain size, thickness, surface roughness, the reduced elastic modulus (Er) and hardness (H) values of Nb thin films increased at the pressure range of 0.61-0.68 Pa. Meanwhile, the porosity of Nb films decreased with the increase in deposition pressure. The lattice deformation of Nb thin films changed from negative to positive with the increase in deposition pressure. It is concluded that deposition pressure influences the microstructure and nanomechanical properties of Nb films.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available