Thermal atomic layer deposition of AlOxNy thin films for surface passivation of nano-textured flexible silicon

Published 2019 View Full Article

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Title
Thermal atomic layer deposition of AlOxNy thin films for surface passivation of nano-textured flexible silicon
Authors
Keywords
Black flexible silicon, Aluminum oxynitride, Surface passivation, Thermal atomic layer deposition, Time-of-flight elastic recoil detection analysis (ToF-ERDA)
Journal
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 193, Issue -, Pages 231-236
Publisher
Elsevier BV
Online
2019-01-24
DOI
10.1016/j.solmat.2019.01.019

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