Thermal atomic layer deposition of AlOxNy thin films for surface passivation of nano-textured flexible silicon

标题
Thermal atomic layer deposition of AlOxNy thin films for surface passivation of nano-textured flexible silicon
作者
关键词
Black flexible silicon, Aluminum oxynitride, Surface passivation, Thermal atomic layer deposition, Time-of-flight elastic recoil detection analysis (ToF-ERDA)
出版物
SOLAR ENERGY MATERIALS AND SOLAR CELLS
Volume 193, Issue -, Pages 231-236
出版商
Elsevier BV
发表日期
2019-01-24
DOI
10.1016/j.solmat.2019.01.019

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