Journal
IEEE ELECTRON DEVICE LETTERS
Volume 40, Issue 5, Pages 742-745Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2019.2908948
Keywords
Ga2O3 MOSFET; enhancement mode; phototransistor; detectivity; photo-to-dark current ratio (PDCR)
Categories
Funding
- National Natural Science Foundation of China [61521064, 61522408, 61574169, 61334007, 61474136, 61574166]
- Ministry of Science and Technology of China [2018YFB0406504, 2016YFA0201803, 2016YFA0203800, 2017YFB0405603]
- Key Research Program of Frontier Sciences of the Chinese Academy of Sciences [QYZDB-SSW-JSC048, QYZDY-SSW-JSC001]
- Opening Project of the Key Laboratory of Microelectronics Devices and Integration Technology, Institute of Microelectronics, Chinese Academy of Sciences
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An enhancement-mode beta-Ga2O3 metal-oxide-semiconductor field-effect solar-blind phototransistor on Si-doped homoepitaxial film grown by molecular beam epitaxy is demonstrated in this letter. Gate-recess process was employed to fully deplete the Ga2O3 channel to achieve positive threshold voltage V-th (7 V), which broadens the operating range of the solar-blind phototransistor. The dark current of about 0.7 pA is extremely low. Under 254-nm light illumination of 63 mu W/cm(2), the change of drain current reaches more than 6 orders of magnitude. Record high detectivity of 1.3 x 10(16) Jones and photo-to-dark current ratio of 1.1 x 10(6) are obtained, respectively. In addition, the rise and decay time are as short as 100 and 30 ms, respectively. High responsivity of 3 x 10(3) A/W and external quantum efficiency of 1.5 x 10(6)% are also achieved with apparent solar-blind photodetection.
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