Comparison of Argon and Oxygen Plasma Treatments for Ambient Room-Temperature Wafer-Scale Au–Au Bonding Using Ultrathin Au Films

Title
Comparison of Argon and Oxygen Plasma Treatments for Ambient Room-Temperature Wafer-Scale Au–Au Bonding Using Ultrathin Au Films
Authors
Keywords
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Journal
Micromachines
Volume 10, Issue 2, Pages 119
Publisher
MDPI AG
Online
2019-02-14
DOI
10.3390/mi10020119

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