Atomic Layer Deposition (ALD) as a Way to Prepare New Mixed-Oxide Catalyst Supports: The Case of Alumina Addition to Silica-Supported Platinum for the Selective Hydrogenation of Cinnamaldehyde
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Title
Atomic Layer Deposition (ALD) as a Way to Prepare New Mixed-Oxide Catalyst Supports: The Case of Alumina Addition to Silica-Supported Platinum for the Selective Hydrogenation of Cinnamaldehyde
Authors
Keywords
Atomic layer deposition, Unsaturated aldehyde hydrogenation, C=O vs. C=C hydrogenation selectivity, Adsorption–desorption isotherms, Pyridine titrations
Journal
TOPICS IN CATALYSIS
Volume -, Issue -, Pages -
Publisher
Springer Nature
Online
2019-03-28
DOI
10.1007/s11244-019-01163-4
References
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