Suppressing the Initial Growth of Sidewall GaN by Modifying Micron-Sized Patterned Sapphire Substrate with H3PO4-Based Etchant

Title
Suppressing the Initial Growth of Sidewall GaN by Modifying Micron-Sized Patterned Sapphire Substrate with H3PO4-Based Etchant
Authors
Keywords
-
Journal
Micromachines
Volume 9, Issue 12, Pages 622
Publisher
MDPI AG
Online
2018-11-27
DOI
10.3390/mi9120622

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