4.6 Article

Evaluation of Pulsed I-V Analysis as Validation Tool of Nonlinear RF Models of GaN-Based HFETs

Journal

IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 65, Issue 12, Pages 5307-5313

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2018.2872513

Keywords

Active harmonic load-pull; current collapse; gallium nitride (GaN); heterojunction field-effect transistor (HFET); high-electron mobility transistor; kink effect; knee walkout; pulsed I-V; trapping effect

Funding

  1. European Space Agency
  2. EPSRC [EP/N031563/1, EP/N016408/1] Funding Source: UKRI

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This paper evaluates the applicability of pulsed I-V measurements as a tool for accurately extracting nonlinear gallium nitride (GaN)-based heterojunction field-effect transistor (HFET) models. Two wafers with the identical layer structure but different growth conditions have been investigated. A series of I-V measurements was performed under dc and pulsed conditions demonstrating a dramatic difference in the kink effect and current collapse (knee walkout) suggesting different trapping behaviors. However, when radio frequency (RF) I-V waveform measurements, utilizing active harmonic load-pull, were used to study the impact of these traps on the RF performance, both wafers gave good loverall RF performance with no significant difference observed. This absence of correlation between pulsed I-V measurement results and RF performance raises a question about the applicability of pulsed I-V measurements alone as a tool for extracting nonlinear device models in the case of GaN HFETs.

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