Hole traps and persistent photocapacitance in proton irradiated β-Ga2O3 films doped with Si
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Title
Hole traps and persistent photocapacitance in proton irradiated β-Ga2O3 films doped with Si
Authors
Keywords
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Journal
APL Materials
Volume 6, Issue 9, Pages 096102
Publisher
AIP Publishing
Online
2018-09-05
DOI
10.1063/1.5042646
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Related references
Note: Only part of the references are listed.- On the feasibility of p-type Ga2O3
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- Perspective—Opportunities and Future Directions for Ga 2 O 3
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- Exfoliated β-Ga2O3 nano-belt field-effect transistors for air-stable high power and high temperature electronics
- (2016) Janghyuk Kim et al. PHYSICAL CHEMISTRY CHEMICAL PHYSICS
- Homo- and heteroepitaxial growth of Sn-doped β-Ga2O3 layers by MOVPE
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- Role of self-trapping in luminescence andp-type conductivity of wide-band-gap oxides
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- Electrical properties of β-Ga2O3 single crystals grown by the Czochralski method
- (2011) K. Irmscher et al. JOURNAL OF APPLIED PHYSICS
- Oxygen vacancies and donor impurities in β-Ga2O3
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