Low temperature atomic layer deposition of highly photoactive hematite using iron(iii) chloride and water
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Title
Low temperature atomic layer deposition of highly photoactive hematite using iron(iii) chloride and water
Authors
Keywords
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Journal
Journal of Materials Chemistry A
Volume 1, Issue 38, Pages 11607
Publisher
Royal Society of Chemistry (RSC)
Online
2013-08-16
DOI
10.1039/c3ta12514a
References
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- Atomic Layer Deposition of Iron Oxide Thin Films and Nanotubes using Ferrocene and Oxygen as Precursors
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- Atomic layer deposition of iron(III) oxide on zirconia nanoparticles in a fluidized bed reactor using ferrocene and oxygen
- (2008) Jonathan R. Scheffe et al. THIN SOLID FILMS
- Characterization and gas-sensing behavior of an iron oxide thin film prepared by atomic layer deposition
- (2007) Mikko Aronniemi et al. THIN SOLID FILMS
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