Surface Roughening of Polystyrene and Poly(methyl methacrylate) in Ar/O2 Plasma Etching

Relationship between nanoscale roughness and ion-damaged layer in argon plasma exposed polystyrene films

(2010) R. L. Bruce et al.   JOURNAL OF APPLIED PHYSICS

Role of polymer structure and ceiling temperature in polymer roughening and degradation during plasma processing: a beam system study of P4MS and PαMS

(2010) D Nest et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening

(2010) T-Y Chung et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Molecular dynamics simulations of near-surface modification of polystyrene: Bombardment with Ar+ and Ar+/radical chemistries

(2008) J. J. Végh et al.   JOURNAL OF APPLIED PHYSICS

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

(2008) M. Sumiya et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Study of 193 nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation

(2008) M. Sumiya et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Study of 193nm photoresist degradation during short time fluorocarbon plasma exposure III. Effect of fluorocarbon film and initial surface condition on photoresist degradation

(2008) M. Sumiya et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B

Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography

(2008) Yuk-Hong Ting et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B