4.4 Article

Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on

Journal

AIP ADVANCES
Volume 4, Issue 10, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.4898150

Keywords

-

Funding

  1. National Science Council Taiwan [103-2221-E-003-023, 102-2221-E-003-030-MY3, 102-2622-E-002-014]

Ask authors/readers for more resources

Using a ferroelectric PbZrTiO3 gate stack, the range of the steep subthreshold swing in tunnel field-effect transistors was extended by 3.5 orders of magnitude demonstrating an improvement in the swing (by approximately double the slope). The drain conductance (g(d)) shows only 16% enhancement with large V-DS (similar to-1.5V) indicates internal voltage amplification with ferroelectric negative capacitance effect beneficial to small lateral drain-source bias voltages (-0.1 V). The concept of coupling the ferroelectric polarization is proposed. The power consumption is also discussed in low-power applications of steep subthreshold slope devices. (C) 2014 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available