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Ferroelectric gate tunnel field-effect transistors with low-power steep turn-on

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AIP ADVANCES
卷 4, 期 10, 页码 -

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AMER INST PHYSICS
DOI: 10.1063/1.4898150

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  1. National Science Council Taiwan [103-2221-E-003-023, 102-2221-E-003-030-MY3, 102-2622-E-002-014]

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Using a ferroelectric PbZrTiO3 gate stack, the range of the steep subthreshold swing in tunnel field-effect transistors was extended by 3.5 orders of magnitude demonstrating an improvement in the swing (by approximately double the slope). The drain conductance (g(d)) shows only 16% enhancement with large V-DS (similar to-1.5V) indicates internal voltage amplification with ferroelectric negative capacitance effect beneficial to small lateral drain-source bias voltages (-0.1 V). The concept of coupling the ferroelectric polarization is proposed. The power consumption is also discussed in low-power applications of steep subthreshold slope devices. (C) 2014 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.

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