Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial silicon

Title
Influence of deposition rate on the structural properties of plasma-enhanced CVD epitaxial silicon
Authors
Keywords
-
Journal
Scientific Reports
Volume 7, Issue 1, Pages -
Publisher
Springer Nature
Online
2017-03-06
DOI
10.1038/srep43968

Ask authors/readers for more resources

Find Funding. Review Successful Grants.

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started