4.6 Article

Phosphorus-containing polymers from tetrakis(hydroxymethyl) phosphonium sulfate III. A new hydrolysis-resistant tris(allyloxymethyl) phosphine oxide and its thiol-ene reaction under ultraviolet irradiation

Journal

RSC ADVANCES
Volume 4, Issue 79, Pages 41705-41713

Publisher

ROYAL SOC CHEMISTRY
DOI: 10.1039/c4ra06080f

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Funding

  1. NSF of China [21274049]
  2. Key Laboratory of Optoelectronic Chemical Materials and Devices of the Ministry of Education, Jianghan University [JDGD-2013-06]
  3. Fundamental Research Fund for Central Universities [2013QN159]

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Two kinds of new phosphorus-containing crosslinked polymer materials were prepared via thiol-ene photopolymerization and their properties were studied. In order to prepare these crosslinked polymer materials, multifunctional monomer tris(allyloxymethyl) phosphine oxide (TAOPO) was synthesized from an eco-friendly raw material, tetrakis(hydroxymethyl) phosphonium sulfate (THPS). Crosslinked poly(phosphine oxide) networks were then produced by a thiol-ene reaction in which TAOPO reacts with the two kinds of polythiol under ultraviolet (UV) irradiation. The new crosslinked polymers possess long-term hydrolysis-resistance property because the monomer TAOPO contains a phosphorus-carbon bond. The crosslinked polymers have a high gel content, high dielectric constant, low dielectric loss, and excellent transparency with a high refractive index and high Abbe number. DMA and TGA results indicated that all cured poly(phosphine oxide) were uniform networks and exhibited a high thermal stability.

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