Journal
RSC ADVANCES
Volume 2, Issue 29, Pages 10809-10812Publisher
ROYAL SOC CHEMISTRY
DOI: 10.1039/c2ra21277c
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Cobalt(III) acetylacetonate (Co(acac)(3)) was used as a precursor to grow pure Co3O4 with pulsed-spray evaporation chemical vapor deposition (PSE-CVD). The effect of solvent and substrate temperature on the growth kinetics and morphology of the films was investigated. The obtained spinel exhibited good catalytic performance.
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