Journal
JOURNAL OF OPTICS
Volume 14, Issue 4, Pages -Publisher
IOP PUBLISHING LTD
DOI: 10.1088/2040-8978/14/4/045702
Keywords
lithography; microscopy; interference; polarization; phase shift; superresolution
Categories
Funding
- Fundamental Research Funds for the Central Universities [2010QNA5035]
- Zhejiang Provincial Natural Science Foundation of China [Y1100408]
- Educational Office of Zhejiang Province [Y201009976]
- State Key Laboratory of Modern Optical Instrumentation (Zhejiang University)
Ask authors/readers for more resources
We present a theoretical approach to extend depth of focus (DOF), which is based on the integrated utilization of the cylindrical polarization effect, circular symmetrical phase mask and interference effect. Simulation results show that this method can generate over 4 lambda and 2 lambda DOFs when objective lenses with NA = 0.9 and 1.4 are introduced respectively, while maintaining the horizontal size beyond the diffraction limit. The DOF is over two times that by conventional approaches under the same conditions. Such a focal spot with extended DOF, although stemming from the STED microscope concept, is applicable in nanolithography.
Authors
I am an author on this paper
Click your name to claim this paper and add it to your profile.
Reviews
Recommended
No Data Available
Share Paper
