Effect of atomic layer deposited ultra thin HfO2 and Al2O3 interfacial layers on the performance of dye sensitized solar cells

Published 2009 View Full Article

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Title
Effect of atomic layer deposited ultra thin HfO2 and Al2O3 interfacial layers on the performance of dye sensitized solar cells
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 518, Issue 10, Pages 2678-2682
Publisher
Elsevier BV
Online
2009-08-27
DOI
10.1016/j.tsf.2009.08.033

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