Effect of atomic layer deposited ultra thin HfO2 and Al2O3 interfacial layers on the performance of dye sensitized solar cells

标题
Effect of atomic layer deposited ultra thin HfO2 and Al2O3 interfacial layers on the performance of dye sensitized solar cells
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 518, Issue 10, Pages 2678-2682
出版商
Elsevier BV
发表日期
2009-08-27
DOI
10.1016/j.tsf.2009.08.033

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