Fabrication and electrical properties of metal-oxide semiconductor capacitors based on polycrystalline p-CuxO and HfO2/SiO2 high-κ stack gate dielectrics

Published 2010 View Full Article

Authors

Keywords

Journal

THIN SOLID FILMS

Volume 518, Issue 15, Pages 4446-4449

Publisher

Elsevier BV

Online

2010-02-12

DOI

10.1016/j.tsf.2010.02.015

Ask authors/readers for more resources

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Become a Peeref-certified reviewer

The Peeref Institute provides free reviewer training that teaches the core competencies of the academic peer review process.

Get Started

THIN SOLID FILMS

Ask authors/readers for more resources

Protocol

Reagent

Reprint

Create your own webinar

Become a Peeref-certified reviewer