Effect of oxygen flow rate on ITO thin films deposited by facing targets sputtering

Published 2010 View Full Article

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Title
Effect of oxygen flow rate on ITO thin films deposited by facing targets sputtering
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 518, Issue 22, Pages 6241-6244
Publisher
Elsevier BV
Online
2010-03-25
DOI
10.1016/j.tsf.2010.03.041

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