Characterization of titanium oxynitride films deposited by low pressure chemical vapor deposition using amide Ti precursor

Published 2008 View Full Article

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Title
Characterization of titanium oxynitride films deposited by low pressure chemical vapor deposition using amide Ti precursor
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 516, Issue 18, Pages 6330-6335
Publisher
Elsevier BV
Online
2008-01-03
DOI
10.1016/j.tsf.2007.12.148

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