Characterization of titanium oxynitride films deposited by low pressure chemical vapor deposition using amide Ti precursor

出版年份 2008 全文链接

标题

作者

关键词

出版物

Volume 516, Issue 18, Pages 6330-6335

出版商

Elsevier BV

发表日期

2008-01-03

DOI

10.1016/j.tsf.2007.12.148

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