Nitridation and oxynitridation of Si to control interfacial reaction with HfO2

标题
Nitridation and oxynitridation of Si to control interfacial reaction with HfO2
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 516, Issue 23, Pages 8498-8506
出版商
Elsevier BV
发表日期
2008-05-17
DOI
10.1016/j.tsf.2008.05.002

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