Phosphorous and boron doping of nc-Si:H thin films deposited on plastic substrates at 150 °C by Hot-Wire Chemical Vapor Deposition

Published 2007 View Full Article

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Title
Phosphorous and boron doping of nc-Si:H thin films deposited on plastic substrates at 150 °C by Hot-Wire Chemical Vapor Deposition
Authors
Keywords
-
Journal
THIN SOLID FILMS
Volume 516, Issue 5, Pages 576-579
Publisher
Elsevier BV
Online
2007-07-11
DOI
10.1016/j.tsf.2007.06.176

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