Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor

Published 2018 View Full Article

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Title
Low-temperature chemical vapor deposition (CVD) of metallic titanium film from a novel precursor
Authors
Keywords
-
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 353, Issue -, Pages 18-24
Publisher
Elsevier BV
Online
2018-08-24
DOI
10.1016/j.surfcoat.2018.08.064

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