Effects of H2 plasma treatment on properties of ZnO:Al thin films prepared by RF magnetron sputtering

Published 2011 View Full Article

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Title
Effects of H2 plasma treatment on properties of ZnO:Al thin films prepared by RF magnetron sputtering
Authors
Keywords
-
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 205, Issue 23-24, Pages 5269-5277
Publisher
Elsevier BV
Online
2011-05-29
DOI
10.1016/j.surfcoat.2011.05.033

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