Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition

Published 2010 View Full Article

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Title
Chemical bonding and composition of silicon nitride films prepared by inductively coupled plasma chemical vapor deposition
Authors
Keywords
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Journal
SURFACE & COATINGS TECHNOLOGY
Volume 204, Issue 18-19, Pages 2923-2927
Publisher
Elsevier BV
Online
2010-03-08
DOI
10.1016/j.surfcoat.2010.02.071

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