Metallic sputtering growth of high quality anatase phase TiO2 films by inductively coupled plasma assisted DC reactive magnetron sputtering

Published 2009 View Full Article

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Title
Metallic sputtering growth of high quality anatase phase TiO2 films by inductively coupled plasma assisted DC reactive magnetron sputtering
Authors
Keywords
-
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 203, Issue 23, Pages 3661-3668
Publisher
Elsevier BV
Online
2009-06-09
DOI
10.1016/j.surfcoat.2009.06.001

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