Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4/N2 dielectric barrier discharge plasma: 13C, 1H solid state NMR, FTIR and elemental analysis

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Title
Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4/N2 dielectric barrier discharge plasma: 13C, 1H solid state NMR, FTIR and elemental analysis
Authors
Keywords
-
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 203, Issue 14, Pages 2013-2016
Publisher
Elsevier BV
Online
2009-02-07
DOI
10.1016/j.surfcoat.2009.01.038

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