Effect of rapid thermal annealing on Si rich SiO2 films prepared using atom beam sputtering technique

Published 2009 View Full Article

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Title
Effect of rapid thermal annealing on Si rich SiO2 films prepared using atom beam sputtering technique
Authors
Keywords
-
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 203, Issue 17-18, Pages 2506-2509
Publisher
Elsevier BV
Online
2009-03-04
DOI
10.1016/j.surfcoat.2009.02.059

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