Atomic layer etching of (100)/(111) GaAs with chlorine and low angle forward reflected Ne neutral beam

Published 2008 View Full Article

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Title
Atomic layer etching of (100)/(111) GaAs with chlorine and low angle forward reflected Ne neutral beam
Authors
Keywords
-
Journal
SURFACE & COATINGS TECHNOLOGY
Volume 202, Issue 22-23, Pages 5701-5704
Publisher
Elsevier BV
Online
2008-06-19
DOI
10.1016/j.surfcoat.2008.06.123

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