Journal
SURFACE & COATINGS TECHNOLOGY
Volume 202, Issue 22-23, Pages 5289-5292Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.surfcoat.2008.06.056
Keywords
Optical emission spectroscopy; Microwave discharge plasma jet; PEN film; Rotational temperature; Vibrational temperature
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To understand the mechanism of surface processing using an atmospheric-pressure non-equilibrium. microwave discharge plasma jet, we used optical emission spectroscopy to measure the vibrational and rotational temperatures of plasma. A microwave (2.45 GHz) power Supply Was used to excite the plasma. The vibrational and rotational temperatures in the plasma were measured at approximately 0.18 eV and 0.22 eV. We also conducted plasma surface processing of polyethylene naphthalate (PEN) film to measure changes in the water contact angle before and after the PEN film was processed, as well as while the rotational temperature of the plasma increased. The hydrophilicity of the PEN film surface was found to improve as the rotational temperature of the plasma increased. Published by Elsevier B.V.
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