Effect of post-deposition annealing temperature on RF-sputtered HfO2 thin film for advanced CMOS technology

Published 2012 View Full Article

  1. Home
  2. Publications
  3. Publication Search
  4. Publication Details
Title
Effect of post-deposition annealing temperature on RF-sputtered HfO2 thin film for advanced CMOS technology
Authors
Keywords
-
Journal
SOLID STATE SCIENCES
Volume 15, Issue -, Pages 24-28
Publisher
Elsevier BV
Online
2012-09-30
DOI
10.1016/j.solidstatesciences.2012.09.010

Ask authors/readers for more resources

Protocol

Community support

Reagent

Community support

Reprint

Contact the author

Find the ideal target journal for your manuscript

Explore over 38,000 international journals covering a vast array of academic fields.

Search

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now
Webinars Posters Questions Hubs Funding Journals Articles Connect Collections Reviewers About Us FAQs Mobile App Privacy Policy Terms of Use
© Peeref 2019-2024. All rights reserved.