Optimization of conditions for growth of vanadium dioxide thin films on silicon by pulsed-laser deposition
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Title
Optimization of conditions for growth of vanadium dioxide thin films on silicon by pulsed-laser deposition
Authors
Keywords
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Journal
AIP Advances
Volume 5, Issue 10, Pages 107118
Publisher
AIP Publishing
Online
2015-10-16
DOI
10.1063/1.4934226
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