Optimization of conditions for growth of vanadium dioxide thin films on silicon by pulsed-laser deposition

标题
Optimization of conditions for growth of vanadium dioxide thin films on silicon by pulsed-laser deposition
作者
关键词
-
出版物
AIP Advances
Volume 5, Issue 10, Pages 107118
出版商
AIP Publishing
发表日期
2015-10-16
DOI
10.1063/1.4934226

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