Writing Highly Ordered Macroscopic Patterns in Cylindrical Block Polymer Thin Films via Raster Solvent Vapor Annealing and Soft Shear

Title
Writing Highly Ordered Macroscopic Patterns in Cylindrical Block Polymer Thin Films via Raster Solvent Vapor Annealing and Soft Shear
Authors
Keywords
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Journal
ACS Macro Letters
Volume 4, Issue 5, Pages 516-520
Publisher
American Chemical Society (ACS)
Online
2015-04-20
DOI
10.1021/acsmacrolett.5b00126

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