Writing Highly Ordered Macroscopic Patterns in Cylindrical Block Polymer Thin Films via Raster Solvent Vapor Annealing and Soft Shear

标题
Writing Highly Ordered Macroscopic Patterns in Cylindrical Block Polymer Thin Films via Raster Solvent Vapor Annealing and Soft Shear
作者
关键词
-
出版物
ACS Macro Letters
Volume 4, Issue 5, Pages 516-520
出版商
American Chemical Society (ACS)
发表日期
2015-04-20
DOI
10.1021/acsmacrolett.5b00126

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