Journal
SMALL
Volume 8, Issue 10, Pages 1563-1569Publisher
WILEY-V C H VERLAG GMBH
DOI: 10.1002/smll.201101960
Keywords
nanoimprinting; zinc oxide (ZnO); self-assembly; block copolymers; nanopatterning
Categories
Funding
- Ministray of the Knowledge Economy of South Korea [10033636]
- Center for Nanoscale Mechatronics & Manufacturing of the Ministry of Education, Science, and Technology of South Korea
- National Research Foundation (NRF)
- South Korean government (MEST) [20110027260, 2011-0005403]
- National Research Laboratory [ROA-2008-000-20057-0]
- MEST [SIRC-2011-0031852]
- Korea Evaluation Institute of Industrial Technology (KEIT) [10033636] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
- National Research Foundation of Korea [2008-0060005, 2010-0005949, 과C6B2012] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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A highly efficient, ultralarge-area nanaolithography that integrates block-copolymer lithography with single-step ZnO nanoimprinting is introduced. The UV-assisted imprinting of a photosensitive solgel precursor creates large-area ZnO topographic patterns with various pattern shapes in a single-step process. This straightforward approach provides a smooth line edge and high thermal stability of the imprinted ZnO pattern; these properties are greatly advantageous for further graphoepitaxial block-copolymer assembly. According to the ZnO pattern shape and depth, the orientation and lateral ordering of self-assembled cylindrical nanodomains in block-copolymer thin films could be directed in a variety of ways. Significantly, the subtle tunability of ZnO trench depth enabled by nanoimprinting, generated complex hierarchical nanopatterns, where surface-parallel and surface-perpendicular nanocylinder arrays are alternately arranged. The stability of this complex morphology is confirmed by self-consistent field theory (SCFT) calculations. The highly ordered graphoepitaxial nanoscale assembly achieved on transparent semiconducting ZnO substrates offers enormous potential for photonics and optoelectronics.
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