4.4 Article

Characterization of GaN-based p-channel device structures at elevated temperatures

Journal

SEMICONDUCTOR SCIENCE AND TECHNOLOGY
Volume 29, Issue 7, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/0268-1242/29/7/075002

Keywords

GaN; p-channel; HFET; HEMT; FET; C-V measurements; I-V measurements

Funding

  1. DFG

Ask authors/readers for more resources

The interest in GaN for logic applications is increasing. With complementary logic architectures requiring the lowest power consumption, the need for GaN-based p-channel transistors is growing. Yet, the knowledge and the maturity of p-channel devices is far behind those of their n-channel counterparts. By analysing p-channel transistors with a high ON/OFF ratio and a low subthreshold swing under elevated temperatures, we attempt to improve this situation. This is the first report on transistor operation at temperatures as high as 175 degrees C.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available