4.4 Article

Characterization of GaN-based p-channel device structures at elevated temperatures

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IOP PUBLISHING LTD
DOI: 10.1088/0268-1242/29/7/075002

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GaN; p-channel; HFET; HEMT; FET; C-V measurements; I-V measurements

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  1. DFG

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The interest in GaN for logic applications is increasing. With complementary logic architectures requiring the lowest power consumption, the need for GaN-based p-channel transistors is growing. Yet, the knowledge and the maturity of p-channel devices is far behind those of their n-channel counterparts. By analysing p-channel transistors with a high ON/OFF ratio and a low subthreshold swing under elevated temperatures, we attempt to improve this situation. This is the first report on transistor operation at temperatures as high as 175 degrees C.

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